aldsim 0.0.2

Simple models for atomic layer deposition

aldsim

Simple models for thin film growth using atomic layer deposition

Motivation

Atomic layer deposition is a thin film growth technique that relies on self-limited surface kinetics. It plays a key role in areas such as microelectronics, and it is applied for energy, energy storage, catalysis, and decarbonization applications.

aldsim implements a series of models to help explore ALD in various contexts and reactor configurations.

It has grown from a collection of papers that we have published over the past 10 years.

Status

aldsim is still in development. Over the next few months it will be expanded to incorporate a variety of models. Please check aldsim's documentation in readthedocs.

Quick install

Through pypi:

pip install aldsim

Usage

Acknowledgements

Argonne's Laboratory Directed Research and Development program

Copyright and license

Copyright © 2024, UChicago Argonne, LLC

aldsim is distributed under the terms of BSD License.

Argonne Patent & Intellectual Property File Number: SF-24-041